(6) Metal HAP in structures or existing as articles as defined in 40 CFR 372.3. (5) Ancillary activities, as defined in § 63.11502(b). (4) Quality assurance/quality control laboratories. (3) Research and development facilities, as defined in CAA section 112(c)(7). An operation is subject if it involves processing with Table 1 HAP solvent or if an intended purpose of the operation is to remove residual Table 1 HAP monomer.
(iii) Fabricating operations (such as spinning or compressing a solid polymer into its end use) compounding operations (in which blending, melting, and resolidification of a solid polymer product occurs for the purpose of incorporating additives, colorants, or stabilizers) and extrusion and drawing operations (converting an already produced solid polymer into a different shape by melting or mixing the polymer and then forcing it or pulling it through an orifice to create an extruded product). This subpart does apply to the manufacture of photographic chemicals. (ii) Manufacture of photographic film, paper, and plate where the material is coated with or contains chemicals. (i) Manufacture of radioactive elements or isotopes, radium chloride, radium luminous compounds, strontium, uranium.
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(2) Production of the following chemical manufacturing materials described in NAICS code 325: (vii) Lead oxide production at Lead Acid Battery Manufacturing Facilities, subject to subpart PPPPPP of this part. (vi) Chemical Manufacturing Area Sources: Chromium Compounds, subject to subpart NNNNNN of this part.
(v) Carbon Black Production, subject to subpart MMMMMM of this part. (iv) Acrylic and Modacrylic Fibers Production, subject to subpart LLLLLL of this part.
(iii) Polyvinyl Chloride and Copolymers Production, subject to subpart DDDDDD of this part. (ii) Mercury Emissions from Mercury Cell Chlor-Alkali Plants, subject to subpart IIIII of this part. (i) Manufacture of Paint and Allied Products, subject to subpart CCCCCCC of this part. (1) Affected sources under the following chemical manufacturing area source categories listed pursuant to Clean Air Act (CAA) section 112(c)(3) and 112(k)(3)(B)(ii) that are subject to area source standards under this part: (c) This subpart does not apply to the operations specified in paragraphs (c)(1) through (6) of this section. A CMPU also includes each storage tank, transfer operation, surge control vessel, and bottoms receiver associated with the production of such NAICS code 325 materials. A CMPU consists of one or more unit operations and any associated recovery devices. (b) A CMPU includes all process vessels, equipment, and activities necessary to operate a chemical manufacturing process that produces a material or a family of materials described by North American Industry Classification System (NAICS) code 325. (iv) Hydrazine or any Table 1 HAP is produced as a product of the CMPU. (iii) Hydrazine and/or Table 1 organic HAP other than quinoline are generated as byproduct and are present in the CMPU in any liquid stream (process or waste), continuous process vent, or batch process vent at an individual concentration greater than 0.1 percent by weight. (ii) Quinoline is generated as byproduct and is present in the CMPU in any liquid stream (process or waste) at a concentration greater than 1.0 percent by weight. If the concentration in an MSDS is presented as a range, use the upper bound of the range. To determine the Table 1 HAP content of feedstocks, you may rely on formulation data provided by the manufacturer or supplier, such as the Material Safety Data Sheet (MSDS) for the material. (i) The CMPU uses as feedstock, any material that contains quinoline, manganese, and/or trivalent chromium at an individual concentration greater than 1.0 percent by weight, or any other Table 1 HAP at an individual concentration greater than 0.1 percent by weight. (2) HAP listed in Table 1 to this subpart (Table 1 HAP) are present in the CMPU, as specified in paragraph (a)(2)(i), (ii), (iii), or (iv) of this section. (1) The CMPU is located at an area source of hazardous air pollutant (HAP) emissions. (a) Except as specified in paragraph (c) of this section, you are subject to this subpart if you own or operate a chemical manufacturing process unit (CMPU) that meets the conditions specified in paragraphs (a)(1) and (2) of this section. § 63.11494 What are the applicability requirements and compliance dates?
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